The clean rooms and other laboratories of the Research Facility for Advanced Science and Technology are equipped with molecular beam epitaxy, chemical vapor deposition（CVD）, a sputtering system, and other film deposition equipment; a mask aligner, electron-beam lithography, inductive coupled plasma（ICP） etching, and other
micro-fabrication equipment; scanning electron microscopy（SEM）, electron spectroscopy for chemical analysis（ESCA）, an atomic force microscope, an X-ray diffractometer, and other analytical equipment, as well as a wide range of other leading-edge equipment used in a wide array of research operations ranging from thin-film deposition of various materials to micro- and nanofabrication and material characterization. Furthermore, this facility is being used to carry out the Nanofabrication Platform Consortium Project supported by the Japanese Ministry of Education, Culture, Sports, Science and Technology（MEXT）, providing technical support on nanomaterial processing and nanofabrication for numerous researchers by utilizing multiuser instruments.

Device process room（Clean room）